Insights into sticking of radicals on surfaces for smart plasma nano-processingHORI, Masaru; GOTO, Toshio.Applied surface science. 2007, Vol 253, Num 16, pp 6657-6671, issn 0169-4332, 15 p.Article

Progress of radical measurements in plasmas for semiconductor processingHORI, Masaru; GOTO, Toshio.Plasma sources science & technology (Print). 2006, Vol 15, Num 2, issn 0963-0252, S74-S83Conference Paper

Formation of microcrystalline diamond using a low-pressure inductively coupled plasma assisted by thermal decomposition of di-t-alkyl peroxideITO, Haruhiko; TEII, Kungen; ITO, Masafumi et al.Diamond and related materials. 2007, Vol 16, Num 2, pp 393-396, issn 0925-9635, 4 p.Article

Measurement techniques of radicals, their gas phase and surface reactions in reactive plasma processingHORI, Masaru; GOTO, Toshio.Applied surface science. 2002, Vol 192, Num 1-4, pp 135-160, issn 0169-4332, 26 p.Conference Paper

Radical-controlled plasma processing for nanofabricationHORI, Masaru; KONDO, Hiroki; HIRAMATSU, Mineo et al.Journal of physics. D, Applied physics (Print). 2011, Vol 44, Num 17, issn 0022-3727, 174027.1-174027.15Article

On the mechanism of polytetrafluoroethylene ablation using a synchrotron radiation-induced photochemical processNAGAI, Hisao; INAYOSHI, Muneto; HORI, Masaru et al.Applied surface science. 2001, Vol 183, Num 3-4, pp 284-289, issn 0169-4332Article

Room-Temperature Si Etching in NO/F₂ Gases and the Investigation of Surface Reaction MechanismsTAJIMA, Satomi; HAYASHI, Toshio; ISHIKAWA, Kenji et al.Journal of physical chemistry. C. 2013, Vol 117, Num 10, pp 5218-5225, issn 1932-7447, 8 p.Article

X-Ray photoelectron spectroscopy analysis of plasma-polymer interactions for development of low-damage plasma processing of soft materialsSETSUHARA, Yuichi; CHO, Ken; SHIRATANI, Masaharu et al.Thin solid films. 2010, Vol 518, Num 22, pp 6492-6495, issn 0040-6090, 4 p.Article

Formation of Nanoporous Features, Flat Surfaces, or Crystallographically Oriented Etched Profiles by the Si Chemical Dry Etching Using the Reaction of F₂ + NO → F + FNO at an Elevated TemperatureTAJIMA, Satomi; HAYASHI, Toshio; ISHIKAWA, Kenji et al.Journal of physical chemistry. C. 2013, Vol 117, Num 40, pp 20810-20818, issn 1932-7447, 9 p.Article

Advanced research and development for plasma processing of polymers with combinatorial plasma-process analyzerSETSUHARA, Yuichi; CHO, Ken; TAKENAKA, Kosuke et al.Thin solid films. 2010, Vol 518, Num 22, pp 6320-6324, issn 0040-6090, 5 p.Article

Geometric characteristics of silicon cavities etched in EDPHUI JU; OHTA, Takayuki; ITO, Masafumi et al.Journal of micromechanics and microengineering (Print). 2007, Vol 17, Num 5, pp 1012-1016, issn 0960-1317, 5 p.Article

Surface roughness development on ArF-photoresist studied by beam-irradiation of CF₄ plasmaTAKEUCHI, Takuya; ISHIKAWA, Kenji; SETSUHARA, Yuichi et al.Journal of physics. D, Applied physics (Print). 2013, Vol 46, Num 10, issn 0022-3727, 102001.1-102001.5Article

Surface Chemical Modification of Carbon Nanowalls for Wide-Range Control of Surface WettabilityWATANABE, Hitoshi; KONDO, Hiroki; HIRAMATSU, Mineo et al.Plasma processes and polymers (Print). 2013, Vol 10, Num 7, pp 582-592, issn 1612-8850, 11 p.Article

Density control of carbon nanowalls grown by CH₄/H₂ plasma and their electrical propertiesHYUNG JUN CHO; KONDO, Hiroki; ISHIKAWA, Kenji et al.Carbon (New York, NY). 2014, Vol 68, pp 380-388, issn 0008-6223, 9 p.Article

SiO₂ etching for optical device using pulse-modulated electron-beam-excited plasmaOHTA, Takayuki; ITO, Masafumi; TAKEDA, Keigo et al.Proceedings of SPIE, the International Society for Optical Engineering. 2005, pp 60500W.1-60500W.9, issn 0277-786X, isbn 0-8194-6086-9, 1VolConference Paper

Epitaxial growth of GaN by radical-enhanced metalorganic chemical vapor deposition (REMOCVD) in the downflow of a very high frequency (VHF) N₂/H₂ excited plasma - effect of TMG flow rate and VHF powerYI LU; KONDO, Hiroki; ISHIKAWA, Kenji et al.Journal of crystal growth. 2014, Vol 391, pp 97-103, issn 0022-0248, 7 p.Article

Investigation of chemical bonding states at interface of Zn/organic materials for analysis of early stage of inorganic/organic hybrid multi―layer formationCHO, Ken; TAKENAKA, Kosuke; SETSUHARA, Yuichi et al.Thin solid films. 2012, Vol 523, pp 15-19, issn 0040-6090, 5 p.Conference Paper

Low-damage plasma processing of polymers for development of organic-inorganic flexible devicesSETSUHARA, Yuichi; CHO, Ken; TAKENAKA, Kosuke et al.Surface & coatings technology. 2010, Vol 205, issn 0257-8972, S355-S359, SUP1Conference Paper

Characteristics of ionized gas metal arc processingTANAKA, M; TAMAKI, T; TASHIRO, S et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5251-5254, issn 0257-8972, 4 p.Conference Paper

Correlation between mechanical, optical and chemical properties of thin films deposited by PECVDCECH, V; STUDYNKA, J; CECHALOVA, B et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5572-5575, issn 0257-8972, 4 p.Conference Paper

Cutting performance of CrN-based coatings tool deposited by hybrid coating method for micro drilling applicationsKANG, M. C; JE, S. K; KIM, K. H et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5629-5632, issn 0257-8972, 4 p.Conference Paper

Decomposition of PFCs by steam plasma at atmospheric pressureKIM, Dong-Yun; DONG WHA PARK.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5280-5283, issn 0257-8972, 4 p.Conference Paper

Deposition of Al-doped and Al, Sc-co-doped zinc oxide films by RF-and DC-sputtering of the ZnO and Al-xSc (x=0, 0.4, 0.8 and 1.7 wt.%) targetsLIN, Jing-Chie; PENG, Kun-Cheng; TSENG, C. A et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5480-5483, issn 0257-8972, 4 p.Conference Paper

Diffusion barriers performance of amorphous Ta-Zr films in Cu metallizationCHUAN LI; HSIEH, J. H; TANG, Z. Z et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5676-5679, issn 0257-8972, 4 p.Conference Paper

Effect of molybdenum and copper on S-phase layer thickness of low-temperature carburized austenitic stainless steelTSUJIKAWA, M; EGAWA, M; UEDA, N et al.Surface & coatings technology. 2008, Vol 202, Num 22-23, pp 5488-5492, issn 0257-8972, 5 p.Conference Paper